IONIX® 8'' HV Planar Magnetron Sputtering Source

Features

The IONIX® IX8 has a target diameter of 203,2 mm (8‘‘) and can be used with non-magnetic targets varying from 6 – 14 mm in small scale production systems. Optionally targets of 200 mm diameter can be used.

The IX8 features indirect cooling of the target. The magnet array is completely isolated from the cooling water. A sliding anode shield enables to adjust the dark space gap for different target thicknesses. A magnetron model for magnetic targets ( 6 mm Ni ) is optionally available.

By means of the ISO63 interface the sputtering source can be either mounted on a straight Ø1‘‘ or Ø3/4‘‘ tube or on a tilt. ISO or CF flange mounted sources are also available.

Technical Data

typeIONIX-8HV
model no.IX8_A120 – A127
formcircular / planar
diameter8” ± 0,2 mm, optional 200 mm
thickness8 to 14 mm
coolingindirect / direct
dark space distance2,5 ± 0,5
diameter255 / 260 mm
height74 mm
weight18,0 kg
construction materialsSS, OF-Cu, PTFE
vacuum interfaceISO63
proposed mounting styleISO hardware

 

 

Cu, 13 Å/s; 2 kW, 20 cm
Ti, 20 Å/s; 2 kW DC; 7,5 cm
Cu, 75 Å/s; 2 kW, 7,5 cm
non-magnetic targets3 x 10-3 to 10-1 mbar Ar
best performance5 x 10-3 to 5 x 10-2 mbar Ar
He leak check≤ 1 x 10-8 mbar Ar * l/s
max. power, watts10 KW DC / 3 KW RF (**)
max. voltage, DC1000 V
max. current, DC25 A
rec. power supply 10 KW
connector DCscrew terminals
connector RF (**)**
water flow1 l / (min x kW)
minimum flow3 l/min
inlet temperature≤ 30°C
max. pressure≤ 3 bar open drain
water tubesØ8xØ6 mm PTFE
magnet arraypermanent NdFeB
max. temperature60 °C

Accessories and options

Mounting options

* This value refers to the magnetron itself. The maximum power is determined by the target material and
its bonding or clamping technique.
** RF-Version requires special connector and/or installation. More details on request.

We reserve the right for technical changes in design and specifications without notice or obligations.

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