IONIX® HV Circular Sputtering Sources
IONIX® high vacuum sputtering sources are available in a wide range of target sizes from 2“ up to 12“ diameter. With our profund knowledge of sputtering technology and our experience we are capable for special designs to serve almost any need and vacuum environment.
IONIX® high vacuum sputtering sources offer a wide range of magnetic and mechanical options, e.g. flange/internal mounted, tilt able/adjustable, magnetrons with electropneumatic shutters, balanced/unbalanced magnet arrays, magnet arrays for high target utilization, for enhanced film thickness uniformity or low operating pressure.
Features
- target-Ø 50 – 300 mm (2” – 12”)
- standardized interfaces (KF/ISO)
- flange or internal mounting
- various magnet array options
- for use with DC-, RF- or HiPIMS processes
- for fundamental research and small scale production
- more than 450 sources supplied
Mechanical and mounting options
- with or without chimney
- +/- 45° tilt or 40° insitu-tilt
- Pneumatic, electric or manual shutter
- Gas distribution
- Quick coupling feedtrough for wall-mounting
- Z-Manipulator
- Flange mounting option
- RF-Power option
Magnetic options
- balanced/unbalanced
- high target utilization
- high film thickness uniformity
- low pressure operation
IONIX® 2'' HV Magnetron
The IONIX® IX2 is the smallest IONIX® high vacuum magnetron with target diameter of 50,8 mm (2‘‘) that is widely used in thin film research and development. It is a versatile tool for small and economic R&D type thin film deposition systems. The target thickness can vary between 2 up to 6 mm.
The IX2 features indirect cooling of the target with a thick membrane plate. The magnet array is completely isolated from the cooling water. The anode shield can be adjusted to set he dark space gap for different target thicknesses. A magnet array for magnetic target materials (2 mm Ni, 1 mm Fe) is optionally available…
IONIX® 3'' HV Magnetron
The IONIX® IX3 high vacuum magnetron with target diameter of 76,2 mm (3‘‘) is widely used in thin film research and development.It is a versatile tool for small and economic R&D type thin film deposition systems. The target thickness can vary between 4 and 8 mm.
The IX3 features indirect cooling of the target with a thick membrane plate. The magnet array is completely isolated from the cooling water. The anode shield can be adjusted to set he dark space gap for different target thicknesses. A magnet array for magnetic target materials (3 mm Ni, 1 mm Fe) is optionally available…
IONIX® 4'' HV Magnetron
The IONIX® IX4 has a target diameter of 101,6 mm (4‘‘) and can be used with non-magnetic targets varying from 4 – 10 mm.
The IX4 features indirect cooling of the target. The magnet array is completely isolated from the cooling water. The anode shield can be adjusted to set the dark space gap for different target thicknesses.
A magnetron model for magnetic target materials (4 … 5 mm Ni, 2 .. 3 mm Fe) is optionally available…
IONIX® 5'' HV Magnetron
The IONIX® IX5 has a target diameter of 127 mm (5‘‘) and can be used with non-magnetic targets varying from 5 – 10 mm.
Features indirect cooling of the target. The magnet array is completely isolated from the cooling water. The anode shield can be adjusted to set the dark space gap for different target thicknesses.
A magnetron model for magnetic targets ( 6 mm Ni ) is optionally available…
IONIX® 6'' HV Magnetron
The IONIX® IX6 has a target diameter of 152,4 mm (6‘‘) and can be used with non-magnetic targets varying from 4 – 12 mm in small scale production systems.
Optionally targets of 150 mm diameter can be used. The IX6 features indirect cooling of the target. The magnet array is completely isolated from the cooling water.
A sliding anode shield enables to adjust the dark space gap for different target thicknesses…
IONIX® 8'' HV Magnetron
The IONIX® IX8 has a target diameter of 203,2 mm (8‘‘) and can be used with non-magnetic targets varying from 6 – 14 mm in small scale production systems.
Optionally targets of 200 mm diameter can be used. The IX8 features indirect cooling of the target. The magnet array is completely isolated from the cooling water. A sliding anode shield enables to adjust the dark space gap for different target thicknesses.
A magnetron model for magnetic targets ( 6 mm Ni ) is optionally available.
IONIX® 10'' HV Magnetron
The IONIX® IX10 has a target diameter of 254 mm (10‘‘) and can be used with non-magnetic targets varying from 8 – 16 mm in small scale production systems.
Optionally targets of 250 mm diameter can be used. The achievable film thickness homogeneity is ±5% on Ø150 mm substrates for selected materials, best distance will be between 50 – 120 mm and must be optimized for each sputtering target material. The IX10 features indirect cooling of the target. The magnet array is completely isolated from the cooling water. A sliding anode enables to adjust the dark space gap for different target thicknesses.
A magnetron model for magnetic targets ( 6 mm Ni ) is optionally available.